| 发明名称 |
Method for producing a device having a chromium layer |
| 摘要 |
Chromium layers are deposited on a substrate by means of a sputter deposition process. By using neon as the working gas at pressures of less than 1 Pa, preferably in the range from 0.2 Pa to 0.5 Pa, the sputter-deposited chromium layers are substantially free of internal stress and have a density which is approximately equal to that of bulk chromium.
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| 申请公布号 |
US5981389(A) |
申请公布日期 |
1999.11.09 |
| 申请号 |
US19970977949 |
申请日期 |
1997.11.25 |
| 申请人 |
U.S. PHILIPS CORPORATION |
发明人 |
VINK, TEUNIS J.;WALRAVE, WILLEM |
| 分类号 |
C23C14/34;C23C14/16;C23C14/18;C23C14/54;H01L21/28;H01L21/283;H01L21/285;H01L21/3205;H01L23/52;H01L29/45;(IPC1-7):H01L21/44 |
主分类号 |
C23C14/34 |
| 代理机构 |
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代理人 |
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