| 发明名称 |
Chemically amplified resists |
| 摘要 |
In general, the invention provides polymers which may be used in chemically amplified resists. More particularly, the invention relates to esterified polymers containing the group: Resist compositions comprise the esterified polymers and photoacid generators.
|
| 申请公布号 |
US5981141(A) |
申请公布日期 |
1999.11.09 |
| 申请号 |
US19970942249 |
申请日期 |
1997.10.01 |
| 申请人 |
SAMSUNG ELECTRICS CO., LTD. |
发明人 |
CHOI, SANG-JUN;PARK, CHUN-GEUN;LEE, HAI-WON |
| 分类号 |
G03F7/004;C08F30/08;C08L43/04;G03F7/039;G03F7/075;(IPC1-7):G03C1/72 |
主分类号 |
G03F7/004 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
