| 摘要 |
<p>PURPOSE:To obtain a color filter having slight unevenness in the spectral characteristics and causing no fog at the opening part by applying an ultraviolet curing type resin contg. an org. dye to a substrate having a positive resist pattern formed thereon, exposing the resin, and exfoliating and removing the resist pattern and the resin on the pattern. CONSTITUTION:A positive resist is applied to a substrate 1, exposed, and developed to form a positive resist pattern, and an ultraviolet curing type resin 8 contg. an org. dye is applied and uniformly exposed to ultraviolet rays to cure the resin 8 and to expose the pattern 7. The pattern 7 is then swollen with a developer, and the resin 8 on the pattern 7 and the pattern 7 are removed by spray washing to obtain a desired filter pattern 9. Thus, the pattern with high dimensional accuracy and high resolution can be formed.</p> |
