| 摘要 |
A process of forming a pattern on a substrate by irradiating light for exposure from a light source to a mask to transfer the pattern of this mask onto the substrate, wherein, before forming the intended final pattern on the substrate, exposure is carried out with an inspection pattern to a diagnostic region in which the final pattern is not to be formed, the distribution of the intensity of light irradiated to the diagnostic region is found, and at least the secondary peak of this distribution of the light intensity is observed, whereby the light source conditions are optimized and the optimized condition light source is used for forming the pattern.
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