发明名称 Semiconductor laminating structure
摘要 To provide a semiconductor laminating structure in which an epitaxial growth of a GaN system material is achieved on a substrate with an excellent matching property with the substrate. The semiconductor laminating structure includes the substrate having a perovskite structure and at least one GaN system chemical compound semiconductor layer formed on the substrate, wherein a major surface of the substrate is formed of a (111) crystal surface.
申请公布号 US5981980(A) 申请公布日期 1999.11.09
申请号 US19970839903 申请日期 1997.04.18
申请人 SONY CORPORATION 发明人 MIYAJIMA, TAKAO;BELLEGO, YANN LE;KAWAI, HIROJI
分类号 H01L29/201;H01L29/812;H01L33/00;H01L33/16;(IPC1-7):H01L33/00 主分类号 H01L29/201
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