发明名称 THIN-FILM EXFOLIATION METHOD, THIN-FILM DEVICE TRANSFER METHOD, THIN-FILM DEVICE, ACTIVE MATRIX SUBSTRATE AND LIQUID CRYSTAL DISPLAYING DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide a method, with which a thin-film device formed on a substrate can be exfoliated easily from the substrate. SOLUTION: An isolation layer 120 is provided on a substrate 100, and a thin-film device 140 such as a TFT, etc., is formed thereon. Exfoliation accelerating ions such as hydrogen ions, for example, are injected into the isolated region 120, in the middle of the formation of the thin film device 140. After the thin- film device 140 has been formed, the thin-film device 140 is connected to a transfer member 180 via a bonded layer 160, and then a laser beam is made to irradiate from the side of the substrate. As a result, the isolation layer 120 is exfoliated, taking advantage of the action of the exfoliation acceleration ions. The thin film device 140 is made to exfoliate from the substrate 100. As a result, the desired thin-film device can be transferred to any type of substrate.</p>
申请公布号 JPH11312811(A) 申请公布日期 1999.11.09
申请号 JP19980296216 申请日期 1998.10.02
申请人 SEIKO EPSON CORP 发明人 INOUE SATOSHI;SHIMODA TATSUYA
分类号 H01L29/786;G02F1/136;G02F1/1368;H01L21/336;H01L21/68;H01L21/762;H01L21/77;H01L21/84;H01L27/12;(IPC1-7):H01L29/786 主分类号 H01L29/786
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