| 摘要 |
PROBLEM TO BE SOLVED: To determine condition in a vapor deposition chamber, by installing an evacuation means exhausting the intermediate chamber between the vapor deposition chamber and a quadrupole mass spectrometer, and mounting a means controlling the pressure of the intermediate chamber. SOLUTION: The organometallic vapor deposition device has a vapor deposition chamber 1. A resistance heater 3 heating a substrate 2, a thermocouple 4 measuring the temperature of the substrate 2, and a pressure sensor 5 for monitoring the internal pressure of the vapor deposition chamber 1, are set up into the vapor deposition chamber 1. An intermediate chamber 22 is fitted between such a vapor deposition chamber 1 and a quadrupole mass spectrometer as a partial-pressure measuring device 23 monitoring gas partial pressure in the vapor deposition chamber 1, the intermediate chamber 22 is exhausted by a turbo-molecular pump 25 as an evacuation means, and the pressure of the intermediate chamber 22 is controlled by controlling the opening and closing of a plurality of variable valves 20 and a variable slit 21 by a control signal from a pressure sensor 24. |
