| 摘要 |
PROBLEM TO BE SOLVED: To simply measure a concentration of alkaline impurities in the air, by applying a chemical sensitization type resist to a substrate, leaving the substrate for a predetermined time in a measurement environment, printing patterns of various different line widths, and detecting a level of the pattern that can be developed. SOLUTION: A chemical sensitization type resist 2 is applied to a test wafer 1. After the wafer is dried, the wafer is left for a predetermined time in an environment to be measured. The wafer is exposed with the use of a test reticle which has a pattern sequentially changed in line width, e.g. including parts (a) of a minute, nearly limit patternable line width, parts (b) of a larger line width and parts (c) of a further larger line width. The wafer is subjected to a predetermined heat treatment to react and then developed in a predetermined manner. The result is confirmed. If the parts (a) of the finest pattern such as C1 are also perfectly developed, alkaline impurities in the air are judged not so bad as to pose a problem. If a layer 2a where alkaline impurities penetrate, e.g. C2 is present, the parts (a) of the line width are judged to include impurities. |
