| 摘要 |
PROBLEM TO BE SOLVED: To provide an X-ray optical element and its manufacture which enable the manufacture without any large variance while decreasing the beam diameter of X rays, and the X-ray analyzing device which can take a working. SOLUTION: This element has a semiconductor substrate 10, a waveguide groove 12 which is formed on the semiconductor substrate 10 and has its surface formed of a specific crystal surface of the semiconductor substrate 10, a waveguide layer 22 which is formed in the waveguide groove 12, and a cap layer 24 formed on the waveguide layer 12. Consequently, the waveguide groove 12 having its surface in a specific surface azimuth of the semiconductor substrate 10 is formed on the semiconductor substrate 10 by the use of a manufacture process for a semiconductor whose microfabrication is easy, so the waveguide layer 22 can easily be formed. Consequently, the beam diameter of X rays is reducible not only longitudinally, but also laterally to the surface of the semiconductor substrate 10, so that X-ray having a small beam diameter can be obtained. Furthermore, this element preferably has a guide layer which is formed of a material having density larger than the semiconductor substrate 10 on the internal surface of the waveguide groove 12. |
