SUBSTRATE PROCESSING DEVICE

摘要

PROBLEM TO BE SOLVED: To reduce the number of parts coming into slidable contact from a shutter mechanism opening or closing an opening of a process chamber and decrease the number of parts of the shutter mechanism. SOLUTION: This substrate processing device comprises a water cleaning process chamber 4 having an opening 4b and a shutter mechanism 70. The opening 4b of the water cleaning process chamber 4 is an opening for carrying a substrate. The shutter mechanism 70 has a round axis member 71 and a lid member 72. The round axis member 71 is disposed near the opening 4b to rotate. The lid member 72 has a greater area than the opening 4b. This shutter mechanism 70 opens or closes the opening 4b by integrally rotating the round axis member 71 and the lid member 72.