| 摘要 |
PROBLEM TO BE SOLVED: To provide a flat mask for a shadow mask without stripe unevenness, by lowering visibility of the stripe unevenness generated by etching. SOLUTION: In this flat mask for a shadow mask, surface-roughness of an electron beam permeating hole meets following formulae, Ra=0.2-1.0μm, Rq=0.3-1.5μm, 1.0<Rq/Ra<=2.0. Preferably, Rq/Ra=1.2-1.5 or Rq=0.3-1.0μm, and desirably, the flat mask is made of a Fe-Ni alloy material.
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