Verfahren zur Messung der Lage von Strukturen auf einer Maskenoberfläche

摘要

The invention relates to a method for measuring structures on a surface of a mask in which the mask is mounted in an image evaluating coordinate measuring device on a measuring table. Said measuring table can be perpendicularly displaced in relation to the optical axis of an imaging measuring system in a manner which is interferometrically measurable. In addition, a mask coordinate system which is assigned to the mask is aligned in relation to a measuring device coordinate system by using alignment marks. The specified position of the structures is predetermined in the mask coordinate system. In addition to the actual position of the structures in the mask coordinate system, the position of at least two outer edges of the mask which are perpendicular to one another is also measured in the mask coordinate system.