| 摘要 |
<p>A hollow type protective member for an inner surface of a chamber of a plasma processing apparatus, comprising a vitrified carbon material of specified properties and capable of being used stably for a long period of time, and a plasma processing apparatus in which the same protective member is provided, the protective member being formed out of a vitrified carbon material, which has a volume resistivity of not higher than 1x10-2 Φ.cm and a thermal conductivity of not lower than 5 W/m.K, into an integral structure, the protective member preferably having a thickness of not less than 4 mm and an average surface roughness (Ra) of its inner surface of not more than 2.0 νm, the plasma processing apparatus being formed by providing such a protective member of the mentioned material and properties along an inner surface of a chamber thereof, electrically connecting the inner surface and protective member together, and grounding the chamber.</p> |
