发明名称 |
Anodic bonding method and apparatus for X-ray masks |
摘要 |
A structure for use in an X-ray membrane (pellicle) mask is provided in which anodic bonding of layers is employed. Anodic bonding as used here provides a permanent bond between the layers, has zero thickness and provides substantial improvements in the obtained flatness of the mask by eliminating conventional glue for attachment. By applying a voltage between a layer, such as silicon, and a glass plate, and simultaneously heating both elements a permanent bond is established which is extremely flat thus providing minimum misalignment of the mask during subsequent X-ray lithography fabrication.
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申请公布号 |
US4632871(A) |
申请公布日期 |
1986.12.30 |
申请号 |
US19840580600 |
申请日期 |
1984.02.16 |
申请人 |
VARIAN ASSOCIATES, INC. |
发明人 |
KARNEZOS, MARCOS;NAKANOS, HOWARD H.;NEUKERMANS, ARMAND P. |
分类号 |
G03F1/00;G03F1/02;G03F1/14;G03F1/16;H01L21/027;(IPC1-7):B32B9/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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