发明名称 Anodic bonding method and apparatus for X-ray masks
摘要 A structure for use in an X-ray membrane (pellicle) mask is provided in which anodic bonding of layers is employed. Anodic bonding as used here provides a permanent bond between the layers, has zero thickness and provides substantial improvements in the obtained flatness of the mask by eliminating conventional glue for attachment. By applying a voltage between a layer, such as silicon, and a glass plate, and simultaneously heating both elements a permanent bond is established which is extremely flat thus providing minimum misalignment of the mask during subsequent X-ray lithography fabrication.
申请公布号 US4632871(A) 申请公布日期 1986.12.30
申请号 US19840580600 申请日期 1984.02.16
申请人 VARIAN ASSOCIATES, INC. 发明人 KARNEZOS, MARCOS;NAKANOS, HOWARD H.;NEUKERMANS, ARMAND P.
分类号 G03F1/00;G03F1/02;G03F1/14;G03F1/16;H01L21/027;(IPC1-7):B32B9/00 主分类号 G03F1/00
代理机构 代理人
主权项
地址