发明名称 |
Polymer composition and resist material |
摘要 |
A polymer composition comprising (i) a polymer (a) having a monomer unit containing a functional group A which becomes alkali-soluble by heating in the presence of an acid, (ii) a polymer (b) having a monomer unit containing a functional group B which also becomes alkali-soluble, but less easily than the functional group A, by heating in the presence of an acid, and if necessary in addition to (i) and (ii) or in place of (ii), (iii) a phenolic compound having a weight-average molecular weight of 300 to 15,000 gives together with an photoacid generator a resist material suitable for forming a pattern excellent in sensitivity, resolution, mask linearity and other properties.
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申请公布号 |
US5976759(A) |
申请公布日期 |
1999.11.02 |
申请号 |
US19960769533 |
申请日期 |
1996.12.19 |
申请人 |
WAKO PURE CHEMICAL INDUSTRIES, LTD. |
发明人 |
URANO, FUMIYOSHI;FUJIE, HIROTOSHI;OONO, KEIJI |
分类号 |
G03F7/004;G03F7/039;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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