PLASMA TREATING DEVICE, THIN FILM PRODUCING DEVICE PROVIDED WITH THE SAME AND PRODUCING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a plasma treating device and method capable of easily realizing treatment by plasma of high density, and to provide a thin film producing device and method using the plasma treating device. SOLUTION: This plasma treating device is provided with an electrode 3 to be applied with voltage for generating plasma, a conductor face having difference in potential with that of plasma generated by the electrode 3, magnets 2 arranged in such a manner that magnetic field components parallel to the conductor face form a closed loop on the side opposite to the electrode 3 with the conductor face interposed and a mechanism of holding the object 7 to be treated between the conductor face and the parallel magnetic field components.