PHOTORESIST POLYMER FOR DEEP UV AND SYNTHETIC METHOD THEREOF,申请号KR19960068907-传众专利搜索

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发明名称	PHOTORESIST POLYMER FOR DEEP UV AND SYNTHETIC METHOD THEREOF
摘要
申请公布号	KR100228771(B1)	申请公布日期	1999.11.01
申请号	KR19960068907	申请日期	1996.12.20
申请人	HYUNDAI ELECTRONICS IND. CO.,LTD	发明人	JUNG, JAE-CHANG;BOK, CHEOL-JYU;BAIK, KI-HO
分类号	G03F7/031;(IPC1-7):G03F7/031	主分类号	G03F7/031
代理机构		代理人
主权项
地址

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