FUSIBLE FUSE IN SEMICONDUCTOR INTEGRATED CIRCUIT AND MANUFACTURE THEREOF

摘要

An integrated circuit is provided having a metal fuse link (36) severable by a laser beam which may enhance the long term reliability of metal interconnects and the fuse link (36). The integrated circuit includes an insulating layer (22) formed on a semiconductor substrate (20); at least one pair of metal wiring layers (38A,38B) formed on the insulating layer (22) and preferably having ends opposite to each other; and a barrier metal fuse layer (32), preferably formed on the upper surfaces of the metal wiring layers, on the side surfaces of the opposing ends and in between the ends, to define a fuse link (36) severable by irradiation with laser beam energy, the fuse layer (32) being less susceptible to electromigration than the metal wiring layers (38A,38B) and/or more absorptive of irradiating laser beam energy than the metal wiring layers (38A,38B).