| 摘要 |
An alkaline aqueous developing solution for developing photoresists or the like contains, as an anti-scum agent, an ethoxylated surfactant having the general formula: R-(O-(CH2-CH2-O)n!m-X (I) where R is a hydrophobic group, X is H or an anionic group, m is from 1 to 3, and n is at least about 15, preferably at least about 20, more preferably at least about 30.
|
