| 摘要 |
PROBLEM TO BE SOLVED: To increase the stability of the solution for forming a thin film and thereby make it possible to form a thin film of the target composition easily, by dissolving at least one of an organic bismuth composition, an organic strontium compound, an organic titanium compound, and an organic tantalum compound in a ring ether derivative. SOLUTION: Triphenylbismuth is preferably used for an organic bismuth compound for forming a thin film. In like manner, strontium dipivaloylmethanate tetraglyme is preferably used for an organic strontium compound and alkoxide such as propoxide, ethoxide, and the like or aβ-diketone compound for a titanium or tantalum compound. As for the organic solvent to dissolve these organic metal compounds in a ring ether derivative, preferably, 2-methyltetrahydrofuran is used. The density of these organic metal compounds in this solution is preferably about 0.05-1 mol/liter. Using these organic metal compounds, a thin film is fabricated by MOCVD.
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