| 摘要 |
PROBLEM TO BE SOLVED: To provide a chemical which can develop a resist pattern without damaging or without requiring an UV irradiation device or the like, and to provide a developing method using this chemical. SOLUTION: This rinsing agent compsn. contains a nitrogen-contg. compd. having 45 to 10000 mol.wt. and having 1-20C hydrocarbon groups and at least one group selected from amino groups, amine groups and groups expressed by the formula in the molecule. The developing method includes a process to develop a resist with a developer of >=10 pH, and a rinsing process by using the rinsing agent compsn. above described. |
