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发明名称
HEAT TREATMENT OF SILICON INSULATING FILM AND MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要
申请公布号
JPH11297689(A)
申请公布日期
1999.10.29
申请号
JP19980095831
申请日期
1998.04.08
申请人
SONY CORP
发明人
KASHIWAGI AKIHIDE
分类号
H01L29/78;H01L21/316;(IPC1-7):H01L21/316
主分类号
H01L29/78
代理机构
代理人
主权项
地址
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