发明名称 PHOTOVOLTAIC DEVICE AND MANUFACTURE THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a photovoltaic device, with high conversion efficiency and improved durability for light irradiation by forming light-absorbing layer of a photovoltaic element placed in an incidence of light with indium nitride, while light-absorbing layer of another photovoltaic element is composed of crystalline silicon, and a method of manufacturing thereof. SOLUTION: A tandem photovoltaic device consists of a top cell 41 and a bottom cell 31 for their basic structural elements. The bottom cell 31 consists of an n-type or p-type single crystalline or polycrystalline silicon substrate 1, a p-type or n-type single crystalline or polycrystalline silicon layer 2, a surface electrode layer 4 and a backside electrode layer 3. The light-absorbing layer of the photoelectric element is single crystalline or polycrystalline silicon 1. The top cell 41 consists of an n-type or p-type InN layer 6, a p-type or n-type InN layer 7, and a transparent conductive layer 3. The light-absorbing layer of the cell is InN layer 6, and the p-type InN layer contains group II elements. In the top cell placed in an incidence of light, indium nitride is used for the light-absorbing layer, while in the bottom cell, crystalline silicon is used for the light-absorbing layer.
申请公布号 JPH11298024(A) 申请公布日期 1999.10.29
申请号 JP19980114227 申请日期 1998.04.09
申请人 RICOH CO LTD 发明人 KONDO HITOSHI;IIJIMA YOSHIHIKO
分类号 H01L31/04 主分类号 H01L31/04
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