发明名称 PLASMA PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To reduce the weight of a device by composing a transmission passage in a container, in such a structure that two coaxial lines of different diameters are connected to each other by a radial line in plasma-processing utilizing high frequency power of 30-300 MHz. SOLUTION: A cathode electrode 54 comprises a large diameter part 56 and a thin and long small diameter part 58, and an upper end surface of the large diameter part 56 faces a plasma generating space 76. On an upper end surface of the large diameter part 56, a subject substrate 66 to be processed is placed. A lower end of the small diameter part 58 is connected via a matching circuit 60 to a high frequency power source 62. A transmission passage in a container comprises a large diameter coaxial line, a small diameter coaxial line, and a radial line connecting these to each other. The large diameter coaxial line is constituted of a large diameter part 56, a first sidewall 42, and an insulation 70. The radial line is composed of a lower surface of the large diameter part 56, an upper surface of a bottom plate 46, and a gap 72. The small diameter coaxial line is composed of a small diameter part 58, a second sidewall 68, and a gap 74. Proper impedance matching is taken between each coaxial line and the radial line.
申请公布号 JPH11297496(A) 申请公布日期 1999.10.29
申请号 JP19980111401 申请日期 1998.04.08
申请人 ANELVA CORP 发明人 SATO HISAAKI;TSUKADA TSUTOMU;MIZUNO SHIGERU;TSUCHIYA NOBUAKI
分类号 H05H1/46;C23C16/50;C23F4/00;H01J37/32;H01L21/205;H01L21/302;H01L21/3065 主分类号 H05H1/46
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