CRYSTALLINE GAS DISTRIBUTOR FOR SEMICONDUCTOR PLASMA ETCH CHAMBER

摘要

A process chamber (15) for processing a semiconductor substrate comprising a support (20) for holding the substrate, a gas distributor (35) for distributing process gas into the process chamber, a gas energizer for energizing the process gas, and an exhaust (60) for exhausting process gas from the process chamber. The gas distributor (35) comprises monocrystalline material that provides increased erosion resistance and withstands high temperatures. Preferably, a thermal expansion isolator (115) supports the gas distributor (35) to allow portions of the gas distributor (35) to thermally expand different amounts. The gas distributor (35) can also comprise a transparent window (170) of solid material that transmits a light beam therethrough. Also, the gas distributor (35) can comprise a transparent portion facing the substrate (25) that allows light emissions from the energized gas to pass through without being reflected back onto the substrate.