发明名称 UNPROCESSED MATERIAL STORING DEVICE AND CARRY-IN/OUT STAGE
摘要 <p>An unprocessed material storing device used to transfer an unprocessed material stored in a space filled with an inactive gas when the unprocessed material such as a semiconductor wafer is transferred between various processing devices, the device comprising a door (46) airtightly opened or closed and a container body (40) storing a semiconductor wafer (W) therein and provided with an inactive gas introducing port and an exhaust port for exhausting an interior atmospheric gas, wherein a diffusion force control member (56) for controlling the diffusion force of an introduced gas is provided at the tip end of an introduction nozzle connected to the introducing port and extending into the container body (40) and a converging force control member (60) for controlling the converging force of an exhaust gas is provided at the tip end of an exhaust nozzle connected to the exhaust port and extending into the container body (40).</p>
申请公布号 WO1999054927(P1) 申请公布日期 1999.10.28
申请号 JP1999001985 申请日期 1999.04.14
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