Heat resistant synthetic quartz glass for equipment used in the heat treatment of semiconductor materials or UV optical components

摘要

A heat resistant synthetic quartz glass, having a low hydroxyl group concentration and having homogeneously distributed zirconium and aluminum contents, is new. A novel heat resistant synthetic quartz glass has a hydroxyl group concentration of 10-300 wt. ppm and contains a homogeneous distribution of 1-100 wt. ppm each of zirconium and aluminum. An Independent claim is also included for production of the above quartz glass by flame hydrolysis formation of silica particles to produce a porous soot body, impregnation with a solution of zirconium and aluminum compounds, drying and vitrification.