发明名称 |
Durch einen Rahmen gestützter Film zum Schutz von photolithographischen Masken |
摘要 |
<p>An improvement is proposed in a frame-supported pellicle, i.e. a thin transparent film of a polymeric resin adhesively bonded to a frame member, used for dust-proof protection of a photomask in a photolithographic patterning work for the manufacture of electronic devices. The improvement comprises using, as the adhesive, an organopolysiloxane-based composition which comprises (a) a perfluoroalkyl-containing diorganopolysiloxane having at least two vinyl groups per mlecule, (b) an organohydrogenpolysiloxane having at least one epoxy group and (c) a platinum catalyst for promoting the hydrosilation reaction between (a) and (b). As compared with conventional adhesives, a quite good adhésive bonding strength can be obtained with this adhesive even when the membrane is made from a fluorocarbon group-containing polymeric resin and the adhesive layer obtained therefrom is highly resistant against ultraviolet irradiation to ensure a long serviceable life of the pellicle.</p> |
申请公布号 |
DE69323917(T2) |
申请公布日期 |
1999.10.28 |
申请号 |
DE1993623917T |
申请日期 |
1993.01.22 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
KUBOTA, YOSHIHIRO;KASHIDA, MEGURU;HAMADA, YUICHI;KISHITA, HIROFUMI;SATO, SHINICHI;YAMAGUCHI, KOUICHI |
分类号 |
C08L83/04;C08K5/5435;C09J183/14;G03F1/62;H01L21/027;(IPC1-7):G03F1/14;C08L83/14 |
主分类号 |
C08L83/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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