发明名称 |
Device manufacture involving lithographic processing. |
摘要 |
<p>Fabrication of devices of micron and submicron minimum feature size is accomplished by lithographic processing involving a back focal plane filter (8). A particularly important fabrication approach depends upon mask patterns which produce images based on discrimination as between scattered (1b) and unscattered (1a) radiation by accelerated electrons. By changing the filter it is possible to produce two complementary patterns from the same mask.</p> |
申请公布号 |
EP0412690(A2) |
申请公布日期 |
1991.02.13 |
申请号 |
EP19900308259 |
申请日期 |
1990.07.27 |
申请人 |
AMERICAN TELEPHONE AND TELEGRAPH COMPANY |
发明人 |
BERGER, STEVEN DAVID;GIBSON, JOHN MURRAY |
分类号 |
G03F1/16;G03F7/20;H01J37/317;H01L21/027;H01L21/30 |
主分类号 |
G03F1/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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