| 摘要 |
The exposure projection apparatus includes an illumination system which illuminates a mask with a light beam, and a optical projection system which projects the image of a pattern formed on the mask onto a substrate. The optical projection system includes a first barrel which holds a plurality of optical elements, at least three second barrels, each holding at least one optical element disposed between the mask and the first barrel, so that the coma, astigmatism, and distortion of the optical projection system can be adjusted, and a first optical element which is disposed between the substrate and the first barrel so that either the spherical aberration or curvature of field of the optical projection system, or both, can be adjusted.
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