| 摘要 |
PROBLEM TO BE SOLVED: To provide a film forming device in which setting area is small, deterioration in the atmosphere in the process chamber is prevented to improve the quality of a film, and maintenance is easy. SOLUTION: A film forming process chamber 10 having a lower face opening part and a load lock chamber 11 having a side face opening part 11a are arranged up and down, and a gate valve 12 opening and shutting the side face opening part 11a of the load lock chamber 11 is disposed. Two substrate holders 16 and 17 supporting substrates S on the upper faces freely close the lower face opening part 10a of the process chamber 10 and are connected to eccentric shafts 13 and 14 arranged in the vertical direction in the load lock chamber 11. By the rotation and elevation of the eccentric shafts 13 and 14 and, while the lower face opening part 10a is shut by either substrate holder, the other substrate holder rotates to the inside and outside of the load lock chamber 11 and executes the taking-in and -out of the substrate S. |
