发明名称 |
Opaque quartz glass and process for production thereof |
摘要 |
Opaque quartz glass is provided which contains gas bubbles uniformly dispersed therein and is excellent in high-temperature viscosity and heat-insulating property. The opaque quartz glass has a defined apparent density, contains bubbles having a defined average bubble diameter in a defined amount, has a defined total bubble sectional area, generally exhibits a defined linear transmittance at a thickness of 1 mm or larger to projected light of a defined wavelength and contains nitrogen in a defined concentration. The opaque quartz glass is produced by a process comprising packing into a mold a powdery source material of powdery silica having a defined average particle diameter and powdery silicon nitride dispersed therein in a defined amount, heating the powdery source material to one of two first defined temperature ranges (both under vacuum) and further heating the source material up to a second temperature higher than the melting point and not higher than 1900 DEG C. in a vacuum or an inert gas atmosphere for vitrification and bubble formation.
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申请公布号 |
US5972488(A) |
申请公布日期 |
1999.10.26 |
申请号 |
US19970887967 |
申请日期 |
1997.07.03 |
申请人 |
TOSOH CORPORATION |
发明人 |
NAGATA, HIROYA;TSUKUMA, KOJI;KUDO, MASAYUKI |
分类号 |
C03B19/09;C03C3/06;C03C11/00;(IPC1-7):B32B17/00 |
主分类号 |
C03B19/09 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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