发明名称 Purification of tantalum by plasma arc melting
摘要 Purification of tantalum by plasma arc melting. The level of oxygen and carbon impurities in tantalum was reduced by plasma arc melting the tantalum using a flowing plasma gas generated from a gas mixture of helium and hydrogen. The flowing plasma gases of the present invention were found to be superior to other known flowing plasma gases used for this purpose.
申请公布号 US5972065(A) 申请公布日期 1999.10.26
申请号 US19970891662 申请日期 1997.07.10
申请人 THE REGENTS OF THE UNIVERSITY OF CALIFORNIA 发明人 DUNN, PAUL S.;KORZEKWA, DENIECE R.
分类号 C22B9/22;C22B34/20;(IPC1-7):C21B11/10;C01G31/00;C22B34/10 主分类号 C22B9/22
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