发明名称 |
Purification of tantalum by plasma arc melting |
摘要 |
Purification of tantalum by plasma arc melting. The level of oxygen and carbon impurities in tantalum was reduced by plasma arc melting the tantalum using a flowing plasma gas generated from a gas mixture of helium and hydrogen. The flowing plasma gases of the present invention were found to be superior to other known flowing plasma gases used for this purpose.
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申请公布号 |
US5972065(A) |
申请公布日期 |
1999.10.26 |
申请号 |
US19970891662 |
申请日期 |
1997.07.10 |
申请人 |
THE REGENTS OF THE UNIVERSITY OF CALIFORNIA |
发明人 |
DUNN, PAUL S.;KORZEKWA, DENIECE R. |
分类号 |
C22B9/22;C22B34/20;(IPC1-7):C21B11/10;C01G31/00;C22B34/10 |
主分类号 |
C22B9/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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