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发明名称
Methods for treating semiconductor wafers
摘要
The present invention presents methods for, inter alia, cleaning and etching semiconductor wafers with a solution containing ammonium fluoride and control of the process used for preparing such a solution at its point of use.
申请公布号
US5972123(A)
申请公布日期
1999.10.26
申请号
US19980096898
申请日期
1998.06.12
申请人
CFMT, INC.
发明人
VERHAVERBEKE, STEVEN
分类号
C03C15/00;C03C23/00;C11D7/06;C11D7/10;C11D11/00;H01L21/304;H01L21/306;H01L21/308;H01L21/311;(IPC1-7):B08B3/12;B08B3/08
主分类号
C03C15/00
代理机构
代理人
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