发明名称 Treatment chamber
摘要 A treatment chamber comprising an inlet port (2) through which helium gas is introduced into a space, an outlet port (1) through which the air replaced with the helium gas from the upper part of the space as the helium gas is introduced thereinto is exhausted, and a treatment space provided in the space and containing a helium gas atmosphere. With this constitution, a material which is easily influenced by the air can be stored and manufactured easily and safely without the influence of the air. Further, a work which produces a large quantity of dust and a work which is not suitable to be worked in the presence of dust can be performed with an improved working efficiency.
申请公布号 AU6523898(A) 申请公布日期 1999.10.25
申请号 AU19980065238 申请日期 1998.04.06
申请人 H.K.M. COMPANY CO., LTD. 发明人 HIKOSHIGE FUJII
分类号 B01J19/14;B29C71/00;C04B40/00;C06B21/00;F26B21/14 主分类号 B01J19/14
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