发明名称 Fluid nozzle system, energy emission system for photolithography and its method of manufacture
摘要 An emitted energy system for use in photolithography may include a fluid nozzle. A nozzle and its method of manufacture are provided. A nozzle (22) may include a nozzle cavity (110) disposed within a nozzle body (100) between an up-stream end (102) and a down-stream end (104). A nozzle passage (118) may be defined within the nozzle cavity (110) and extend a longitudinal length (120) from the down-stream end (104) of the nozzle body (100) into the nozzle cavity (110). A discharge orifice (124) may also be defined at the down-stream end (104) of the nozzle cavity (110) and have an associated width (126). The width (126) of the discharge orifice (124) may be substantially less than the longitudinal length (120) of the nozzle passage (118). The method of manufacture may include fabricating a recess (206) in a first side (202) of an article (200). An article passage (216) may be fabricated between a second side (204) of the article (200) and the recess (206). An insert (220) may be provided sized to fit the recess (206). An insert passage (230) may be fabricated in the insert (220). The insert (220) may then be secured in the recess (206), with the insert passage (230) and the article passage (216) aligned.
申请公布号 AU3469999(A) 申请公布日期 1999.10.25
申请号 AU19990034699 申请日期 1999.04.02
申请人 ADVANCED ENERGY SYSTEMS, INC. 发明人 EDWIN G. HAAS;ROBERT M. GUTOWSKI;VINCENT S. CALIA
分类号 B05B1/00;B05B1/34;G03F7/20;H01L21/027;H05G2/00 主分类号 B05B1/00
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