| 摘要 |
<p>Intended is to provide a chemically amplified resist composition which has a high sensitivity and exhibits high resolution, and is excellent in adaptivity for a variety of processes and excellent with respect to the stability of operation of a process using it, and can provide a good pattern shape, and is thus suitable as a micromachining material for use in manufacturing an integrated circuit element or the like. Such a chemically amplified resist composition comprises (a) an organic substance containing a substituent capable of liberating upon being contacted with an acid and (b) a compound generating an acid upon exposure to a radiation (acid-generating agent) which comprises at aleast one onium salt and at least one of sulfone and sulfonate compounds. Preferably, the chemically amplified resist composition further comprises a basic compound.</p> |
