| 摘要 |
<p>A process system requiring a smaller floor space and capable of providing a smooth flow of gas and a desirable plasma, which efficiently produces and maintains a plasma while reducing losses of high-frequency power supplied for plasma processing. The system comprises a process chamber (403) connected to an upper part of a transfer chamber (402) through a gate (416) (Figure 4), a stage (406) isolated from the outside and provided with a plate (412) for supporting an object (415) of processing, means (410) for moving the plate (412) of the stage (406) through the gate (416) between the transfer chamber (402) and the process chamber (403) while isolating the transfer chamber (402) from the outside, and means (413, 414) for isolating the transfer chamber (402) from the process chamber (403) when the plate (412) is in process chamber (403).</p> |
