发明名称 METHOD AND DEVICE FOR ANALYZING X-RAY DIFFRACTION
摘要 <p>PROBLEM TO BE SOLVED: To reliably measure in-plane diffraction even at a laboratory level without any need for constructing a large-scale facility by easily creating paral lel X-ray beams with a high intensity. SOLUTION: In a method, an X-ray diffraction method for detecting in-plane diffraction rays being diffracted on a crystal surface that is vertical to a sample surface using an X-ray counter 8 is made when X rays R1 are applied to a sample 7 at a small incidence angleδ. X rays being generated from an X-ray source F are diffracted by a parabolic surface multilayer film monochrometer 1 and then are applied to the sample 7. The parabolic surface multilayer film monochrometer 1 is formed by laminating a heavy element layer and a light element layer alternately for a plurality of times, and further a surface that is the surface of the parabolic surface multilayer film monochrometer 1 and where X rays are applied is formed on the parabolic surface. The parabolic surface multilayer film monochrometer 1 can form parallel X-ray beams with an extremely high intensity, thus reliability measuring in-plane diffraction.</p>
申请公布号 JPH11287773(A) 申请公布日期 1999.10.19
申请号 JP19980108574 申请日期 1998.04.03
申请人 RIGAKU DENKI KK 发明人 OMOTE KAZUHIKO
分类号 G01N23/207;G21K1/06;(IPC1-7):G01N23/207 主分类号 G01N23/207
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