发明名称 |
Method for forming thermistor thin film |
摘要 |
A thermistor film is prepared by first preparing an alcohol solution is prepared by dissolving a metal compound in one or more kinds of polyvalent alcohols selected from the group consisting of ethylene glycol, diethylene glycol and glycerin. A coating solution is then prepared by adding and mixing an organic acid having a carboxyl group to the alcohol solution. The coating solution is coated on the surface of a heat-resistant substrate to form a coating film, the substrate on which the coating film is formed is dried and subjected to heat treatment to form a composite oxide precursor containing a metal of the above metal compound, and the precursor is calcined at a temperature of 600 DEG to 1000 DEG C. The method of the present invention can form a thermistor thin film which is dense and uniform over a wide range by simple and easy operations at a low cost.
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申请公布号 |
US5273776(A) |
申请公布日期 |
1993.12.28 |
申请号 |
US19920984216 |
申请日期 |
1992.11.30 |
申请人 |
MITSUBISHI MATERIALS CORPORATION |
发明人 |
YONEZAWA, TADASHI;YAMANAKA, SEIJI;SOE, TAKESHI |
分类号 |
C23C18/12;(IPC1-7):B05D5/12 |
主分类号 |
C23C18/12 |
代理机构 |
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代理人 |
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地址 |
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