发明名称 X-RAY MASK AND MANUFACTURE THEREOF
摘要 PROBLEM TO BE SOLVED: To provide an X-ray mask, which has a transfer circuit pattern having an alignment mark and high positional accuracy and can be manufactured through a simplified manufacturing process. SOLUTION: On a substrate 2, a membrane 3 which transmits X-rays, is formed. On the membrane 3, an X-ray absorbing body 4, which shields the transmission of the X-rays, is formed. The substrate 2 includes a window part 11 for making the membrane 3 exposed. The X-ray absorbing body 4 includes a circuit pattern 10 for transfer and an alignment mark 7, which is formed in the region that is not overlapped in the plane with the window part 11. As a result, the X-ray mask having high position accuracy can be obtained by a simplified manufacturing process, without complicating the manufacturing process as in the conventional method.
申请公布号 JPH11288863(A) 申请公布日期 1999.10.19
申请号 JP19980088436 申请日期 1998.04.01
申请人 MITSUBISHI ELECTRIC CORP 发明人 KICHISE KOJI;YABE HIDETAKA;AYA ATSUSHI;KITAMURA KAEKO;MARUMOTO KENJI;AMI SHIGETO
分类号 G03F1/22;G03F1/42;G03F9/00;H01L21/027 主分类号 G03F1/22
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