| 摘要 |
PROBLEM TO BE SOLVED: To make it possible to exactly form patterns of a micron unit on the surface of a transparent substrate by laminating a transparent wear resistant film on a light shielding film, such as metallic film formed with the patterns of circuits, etc., on the substrate. SOLUTION: An exposure roll 30 comprises a substrate roll 35 consisting of a transparent hollow quarts glass cylinder, a mask 1 affixed to the outer peripheral part of the substrate roll 35 and a light source 36 disposed in the substrate roll 35. The mask 1 affixed to the outer peripheral part of the substrate roll 35 is pressed to the outer peripheral surface of the substrate roll 35 and the wear resistant film of the mask 1 is affixed to the substrate roll 35 toward the outside surface side. The exposure roll 30 may be constituted as well by omitting the transparent substrate of the mask 1 and directly laminating the light shielding film and the wear resistant film on the peripheral surface of the substrate roll 35. The light cast from the light source 36 in such constitution passes the substrate roll 35 and is cast outside through the mask 1, then through the pattern portions and wear resistant film of the light shielding film of the mask 1. |
