| 摘要 |
PURPOSE:To expose an optimum bit shape to light with a good reproducibility by arranging an optical system, which has beam expanders different by beam expander ratios, on the optical path through which an exposure beam goes to an objective lens. CONSTITUTION:In this exposure device, X and Y components of elliptically polarized light are changed by an E/O modulator 8 to make the light incident on beam expanders 11 and 12 different by beam expander ratios. Components of elliptically polarized light are adjusted by the E/O modulator 8 so that the light passes the beam expander 12 which forms a thick beam phi2, thereby obtaining the groove shape of high sharpness. Components of elliptically polarized light are adjusted by the E/O modulator 8 so that the light passes the beam expander 11 which forms a narrow beam phi1, thereby obtaining the groove shape of low sharpness. Consequently, pit shapes most suitable for respective information signals of an address part, a data part, etc., generated on a photoresist plate 5 are exposed to light with a good reproducibility. |
