发明名称 Method of depositing of an oxide superconducting thin film and manufacturing apparatus.
摘要 <p>Disclosed herein is an apparatus for manufacturing an oxide superconducting film employing laser ablation method. This apparatus comprises a thin film forming chamber (3) having a laser-transparent laser entrance window (2), a target (4) being provided in the thin film forming chamber and containing components of an oxide superconductor, a laser beam source (1) for irradiating the target (4) with a laser beam from the exterior of the thin film forming chamber through the laser entrance window (2), and means (8,11) for controlling power of the laser beam which is applied to the target for preventing the power of the laser beam, being applied to the target, from reduction by contamination (7) of the entrance window (2) caused by scattered particles. According to the present invention, it is possible to form an oxide superconducting film having high and uniform characteristics even if a long time is required for film formation, thereby attaining a remarkable effect in improvement of superconductivity of a large area oxide superconducting film.</p>
申请公布号 EP0584562(A2) 申请公布日期 1994.03.02
申请号 EP19930112010 申请日期 1993.07.27
申请人 SUMITOMO ELECTRIC INDUSTRIES, LIMITED 发明人 FUJINO, KOUSOU;TAKANO, SATOSHI , C/OSAKA WORKS OF SUMITOMO;YOSHIDA, NORIYUKI, C/OSAKA WORKS OF SUMITOMO;HARA, TSUKUSHI;ISHII, HIDEO
分类号 C01G1/00;C23C14/28;C23C14/46;C23C14/54;C30B23/08;H01B12/06;H01B13/00;H01L39/24;(IPC1-7):H01L39/24;C23C14/52 主分类号 C01G1/00
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