| 摘要 |
PROBLEM TO BE SOLVED: To automatically select a pattern extraction method most suited to an arbitrary combination of substrate and mark and recognize the position appropriately. SOLUTION: The position recognizing device is provided with an image- sensing system 1 or sensing an object to be inspected and an image processing means 5, which processes signals outputted from the image-sensing system 1 and holds a plurality of pattern extraction methods for extracting characteristic patterns. Furthermore, it is provided with quantitative analyzing devices 2 and 3 for quantitatively analyzing the signals of the characteristic pattern and the luminance of background signal and a control part 4, for selecting the pattern extraction method for the image-processing means 5, in accordance with the result of the quantitative analysis. As a result of this configuration, the distribution of luminance among areas can be determined on the basis of the result of the quantitative analysis of image luminance level with respect to the respective areas of characteristic pattern and the background, and an appropriate pattern extraction method can be selected in accordance with the distribution of the luminance of an image. |
