发明名称 |
Direct liquid injection of liquid ammonia solutions in chemical vapor deposition |
摘要 |
The invention encompasses delivery of reactants for chemical vapor deposition by direct liquid injection of a liquid ammonia solution. In a preferred embodiment, a solution of titanium tetraiodide in liquid ammonia provides reactants for the deposition of titanium nitride.
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申请公布号 |
US5968594(A) |
申请公布日期 |
1999.10.19 |
申请号 |
US19960673379 |
申请日期 |
1996.06.28 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
HU, JIANHUA;GROSSHART, PAUL F. |
分类号 |
C23C16/34;C23C16/448;(IPC1-7):C23C16/34 |
主分类号 |
C23C16/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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