首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
CHEMICAL MECHANICAL POLISHING APPARATUS
摘要
申请公布号
KR100224726(B1)
申请公布日期
1999.10.15
申请号
KR19960060517
申请日期
1996.11.30
申请人
SAMSUNG ELECTRONICS CO, LTD.
发明人
HA, SANG LOK
分类号
H01L21/304;(IPC1-7):H01L21/304
主分类号
H01L21/304
代理机构
代理人
主权项
地址
您可能感兴趣的专利
ARRANGEMENT FOR PROTECTING REFRACTORY LINING OF METALLURGICAL FURNACE ARCH
METHOD OF DRYING LOOSE MATERIAL
GAS DRYING INSTALLATION
ROTARY FURNACE FOR THERMAL DISPOSAL OF SOLID WASTE
CYCLONE FURNACE
METHOD AND APPARATUS FOR CONTROLLING MULTIDISK FRICTION CLUTCHES WITH HYDRAULIC DRIVE
PRESSURE TRANSDUCER
METHOD OF CHECKING SURFACE DEFECTS
GAUGE BLOCK
PISTON-TYPE I.C. ENGINE
BLOCK STEEL SUPPORT
DEVICE FOR DRIVING TRANSLOADING BIN OF ENTRY-DRIVING AND WINNING SET
CUTTING HEAD OF MINING MACHINE
APPARATUS FOR TIGHTNESS-TESTING OF DRILL PIPES IN HOLE
BLADED BIT FOR ROTARY DRILLING
ARRANGEMENT FOR LUBRICATING THE BEARINGS OF BIT ROLLERS
METHOD OF ISOLATING BRINE INFLOW INTO WELL
REINFORCEMENT SKELETON FOR FERROCONCRETE COLUMN CANTILEVER MEMBERS
WORKING MEMBER OF EARTH-MOVING MACHINE
GRADER