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发明名称
CLEANING SOLUTION FOR SEMICONDUCTOR SUBSTRATE
摘要
申请公布号
KR100225147(B1)
申请公布日期
1999.10.15
申请号
KR19930003663
申请日期
1993.03.11
申请人
MITSUBISHI GAS CHEMICAL COMPANY, INC.
发明人
SGIHARA, YASUO;DANAKA, GAZSIGE;SAKUMA, IKUE
分类号
H01L21/304;(IPC1-7):H01L21/304
主分类号
H01L21/304
代理机构
代理人
主权项
地址
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