RADIATION SENSITIVE COMPOSITION

摘要

PROBLEM TO BE SOLVED: To permit high resolution capable of matching quater-micron lithography using radiation by incorporating a specified coat film forming resin and an acid generator. SOLUTION: The radiation sensitive composition contains the coat film forming resin (a) and the acid generator (b), and the resin (a) is an alkali-soluble resin having phenolic hydroxyl groups or a resin having some of phenolic hydroxyl groups protected with acid decomposable groups and further one parts of the phenolic hydroxyl groups are cross-linked with each other to form structural units each represented by formulae I and II in which X is a divalent bonding group; and Y is a trivalent bonding group. The alkali-soluble resin having the phenolic hydroxyl groups can be embodied by a poyvinylphenol or novolak resin or their derivatives or the polyvinylphenol resin. The polyvinylphenol derivatives are, such as ones obtained by polymerizing hydroxystyrene or copolymerizing the hydroxystyrene with other various kinds of vinyl monomers.