| 摘要 |
A vacuum processing apparatus in which LCD substrates are processed includes three process chambers. Each of the process chambers is connected to a first load lock chamber through a gate valve. A second load lock chamber is also connected to the first load lock chamber through a gate valve. The second load lock chamber is opposed to a carrier member, which is arranged in the atmosphere, through a gate valve. A carrier arm is arranged in the first load lock chamber to carry the substrates between each of the process chambers and the second load lock chamber. A buffer rack for supporting two substrates thereon and positioners for aligning the two substrates, which are supported on the buffer rack, simultaneously are arranged in the second load lock chamber. |
